8.9 Nano Inspection

Computational parallel inspection

Exnodes detects 20 nanometer defects at 120 wafers/hour to maximize yield of computer chips. Using an 8.9 nanometer sensitivity breakthrough with visible light, computational parallel inspection (CPI) enables unpatterned wafer inspection without the baggage of DUV. While standard methods rely on brute force increasing of scattered signal levels with shorter wavelengths, CPI rethinks nanoscale defect detection with information theory and maximizes sensitivity by leveraging the maturity and gentleness of visible light.

License from Exnodes.